Product Introduction
Oxidation-resistant reverse osmosis membrane element
Oxidation-resistant reverse osmosis membrane element is suitable for desalination and TOC removal of oxidizing aqueous solution, especially for purification of high-concentration hydrogen peroxide. The membrane element has the characteristics of high TOC and boron removal rate and can be used in the preparation process of electronic-grade hydrogen peroxide.
Product Specifications Performance Parameters Table
|
Membrane element series |
Model |
Stable Desalination rate |
Water production |
Effective membrane area |
Feed spacer |
Test solution concentration |
Test pressure |
Recovery rate |
|||
|
% |
GPD |
m³/d |
ft2 |
m2 |
mil |
mg/L |
psi |
MPa |
% |
||
|
Oxidation resistant film |
OR-400 |
99.8 |
8000 |
36.4 |
400 |
37.2 |
28 |
NaCl： 2000 |
400 |
2.76 |
15 |
Test conditions: NaCl aqueous solution, temperature 25 ℃, pH 7.5-8.0, recovery rate 15%; water production range ±15%
Operating conditions
Operating conditions for acid-resistant, high-pressure-resistant, oxidation-resistant, and amide-resistant reverse osmosis membranes:
|
Maximum operating pressure |
1200psi (8.27MPa) |
|
Maximum water inlet temperature |
45℃ |
|
Maximum inlet silt density index SDI15 |
5.0 |
|
Residual chlorine tolerance |
0.1mg/L |
|
Inlet water pH range during continuous operation |
Acid-resistant high-pressure film: 0-11 Oxidation-resistant film: 2-12 Amide solvent-resistant film: 2-11 |
|
Chemical cleaning (30 min) pH range of influent water |
1-13 |
|
Maximum allowable pressure drop of a single membrane element |
15psi (0.10MPa) |
